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Synthetic Route & Market Prospect of 3-(Trimethoxysilyl)-N-[3-(Trimethoxysilyl)Propyl]Propan-1-Amine by Top Manufacturer
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Bis[(3-trimethoxysilyl)propyl]amine CAS:82985-35-1 manufacturer
to 3-(Trimethoxysilyl)-N-[3-(Trimethoxysilyl)propyl]propan-1-amine

Synthetic Route to 3-(Trimethoxysilyl)-N-[3-(Trimethoxysilyl)propyl]propan-1-amine

3-(Trimethoxysilyl)-N-[3-(trimethoxysilyl)propyl]propan-1-amine, also known as TSPA, is a unique and versatile organosilicon compound that has found application in various fields. TSPA is a silane coupling agent, which means it can be used to improve the bonding between inorganic materials, such as glass, metals, and ceramics, and organic materials, such as polymers, resins, and adhesives. TSPA is also a functional silane, which means it can impart specific properties to the materials it is added to, such as water repellency, adhesion, and corrosion resistance.

The synthesis of TSPA is a complex and multi-step process that involves several chemical reactions and purification steps. The starting material for the synthesis of TSPA is 3-chloropropyltrimethoxysilane, which is commercially available and relatively inexpensive. The first step is the reaction of 3-chloropropyltrimethoxysilane with sodium azide to form 3-azidopropyltrimethoxysilane. This reaction is carried out in anhydrous solvent, such as tetrahydrofuran, and under nitrogen atmosphere to prevent the formation of explosive diazido compounds.

The next step is the reduction of 3-azidopropyltrimethoxysilane to 3-amino-propyltrimethoxysilane. This reaction is typically carried out using hydrogen gas and palladium catalyst. The reaction is carried out under pressure and at elevated temperature to ensure complete reduction of the azide group to the amine group. The product is then purified by distillation or chromatography to remove any impurities.

The final step is the reaction of 3-aminopropyltrimethoxysilane with 3-chloropropyltrimethoxysilane to form TSPA. This reaction is carried out in the presence of a catalyst, such as titanium tetrachloride or tin chloride, and under anhydrous conditions. The reaction is typically carried out at elevated temperature and under reflux to ensure complete conversion of the starting materials to TSPA. The product is then purified by distillation or chromatography to remove any unreacted starting materials or by-products.

The synthetic route to TSPA is a well-established process that has been optimized over the years to ensure high yield and purity of the product. The process is scalable and can be carried out in large quantities to meet the demand of various industries. TSPA is used in a wide range of applications, such as coatings, sealants, adhesives, composites, and electronics.

In the coatings industry, TSPA is used as a crosslinking agent for epoxy, polyurethane, and acrylic coatings. TSPA improves the adhesion of the coating to the substrate and enhances its resistance to water, chemicals, and abrasion. TSPA also improves the hardness and durability of the coating, making it suitable for harsh environments, such as marine and automotive applications.

In the sealants and adhesives industry, TSPA is used as a coupling agent for silane-modified polymers and resins. TSPA improves the bonding between the substrate and the sealant or adhesive, resulting in a stronger and more durable bond. TSPA also improves the resistance of the sealant or adhesive to water, heat, and UV radiation, making it suitable for outdoor and high-temperature applications.

In the composites industry, TSPA is used as a surface modifier for glass fibers and carbon fibers. TSPA improves the bonding between the fibers and the resin matrix, resulting in a stronger and more homogeneous composite. TSPA also improves the resistance of the composite to moisture, chemicals, and thermal cycling, making it suitable for aerospace, construction, and sporting goods applications.

In the electronics industry, TSPA is used as a surface modifier for glass substrates and silicon wafers. TSPA improves the adhesion of the thin films deposited on the substrates, such as metal, oxide, and nitride films. TSPA also improves the electrical properties of the films, such as conductivity, dielectric constant, and breakdown voltage, making them suitable for microelectronics, optoelectronics, and photovoltaics applications.

In conclusion, the synthetic route to 3-(trimethoxysilyl)-N-[3-(trimethoxysilyl)propyl]propan-1-amine, or TSPA, is a complex and multi-step process that has been optimized to ensure high yield and purity of the product. TSPA is a versatile and unique organosilicon compound that has found application in various fields, such as coatings, sealants, adhesives, composites, and electronics. TSPA improves the bonding, adhesion, and resistance of the materials it is added to, making them suitable for a wide range of applications. The use of TSPA can result in products that are stronger, more durable, and more resistant to harsh environments.
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