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Tetrakis(butoxyethoxy)silane: A Key Ingredient in the Chemical Industry
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Tetrakis(butoxyethoxy)silane CAS:18765-38-3 manufacturer
Tetrakis(butoxyethoxy)silane: A Key Ingredient in the Chemical Industry

Tetrakis(butoxyethoxy)silane, also known as DYNASIL BG, is a versatile chemical compound that finds extensive use in various industrial applications. It is an orthosilicate ester that is formed by the reaction of tetraethyl orthosilicate (TEOS) with butoxyethanol. The resulting compound has four butoxyethoxy groups attached to the silicon atom, making it highly functional and reactive.

In the chemical industry, Tetrakis(butoxyethoxy)silane is primarily used as a crosslinking agent for silicone rubber and as a coupling agent for reinforcing fillers in rubber and plastic composites. It has excellent adhesion to various substrates, including metal, glass, and ceramics, making it useful in coatings, adhesives, and sealants. It is also used as a precursor for the synthesis of mesoporous silica and other advanced materials.

One of the key features of Tetrakis(butoxyethoxy)silane is its ability to react with water to form silica gel. This reaction is known as hydrolysis and is a critical step in the preparation of many silica-based materials. By controlling the hydrolysis reaction, the properties of the resulting materials can be tailored to suit specific applications. For example, hydrolysis of Tetrakis(butoxyethoxy)silane can yield a highly porous silica gel that is used as a desiccant in moisture-sensitive applications.

Another important application of Tetrakis(butoxyethoxy)silane is in the production of silicone rubber. It is used as a crosslinking agent in the presence of a catalyst to form a three-dimensional network of polymer chains. This network imparts the desired mechanical and chemical properties to the rubber, such as high temperature resistance, weatherability, and flexibility.

In addition to its use in the chemical industry, Tetrakis(butoxyethoxy)silane is also used in the semiconductor industry. It is a precursor for the deposition of silicon dioxide films by chemical vapor deposition (CVD) and plasma-enhanced chemical vapor deposition (PECVD) methods. These films are used as dielectric layers in microelectronic devices, such as integrated circuits and memory chips.

INNO Specialty Chemicals is a leading manufacturer and supplier of Tetrakis(butoxyethoxy)silane from China. The company has a state-of-the-art production facility equipped with advanced technology and equipment. It has a team of highly skilled professionals who ensure that the product meets the highest quality standards.

In conclusion, Tetrakis(butoxyethoxy)silane is a highly functional and reactive compound that finds extensive use in various industrial applications. Its ability to crosslink silicone rubber, act as a coupling agent for fillers, and form silica gel through hydrolysis makes it a key ingredient in the chemical industry. Its use in the semiconductor industry for the deposition of silicon dioxide films also highlights its versatility. INNO Specialty Chemicals, as a leading manufacturer and supplier of Tetrakis(butoxyethoxy)silane, ensures that the product meets the highest quality standards and is readily available to meet the demands of the industry.
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